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mocvd materials
  •    Available material

  • TMGa, DESe, TEGa,TMAl.. etc.
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MOCVD Sources
Organometallic & Chemicals  FORMULA  PURITY(%)
Al
Aluminium chloride anhydrous AlCl3  99.0+%
Trimethylaluminium  (CH3)3Al  99.999+%
Triethylaluminium (C2H5)3Al 99.999+%
Aluminium isopropoxide  (I-C3H7O)3Al  99.99+%
Dimethylaluminiumhydride  (CH3)2AlH  99.999+%
Tris-tert-butylaluminium  (t-C4H9)3Al  99.999+%
Trimethylaminealane  (CH3)3NAIH3  99.999+%
Dimethylethylaminealane  (CH3)2(C2H5)NAIH3  99.999+%
As
Trimethylarsine  (CH3)3As  99.999+%
Diethylarsine  (C2H5)2AsH  99.999+%
Tert-Butylarsine t-C4H9AsH2  99.999+%
Phenylarsine C6H5AsH2  99.999+%
Tris-(dimethylamino)-arsine As(N(CH3)2)3 99.999+%
Arsenic trichloride  AsCl3  99.999+%
B
Boron tribromide  BBr3  99.9999+%
Triethylboron  (C2H5)3B  99.999+%
Bi
Trimethylbismuth  (Ch3)3Bi  99.999+%
Br
Bromomethane CH3Br  99.99+%
Bromoethane  C2H5Br  99.99+%
2-Bromopropane  (i-C3H7)Br  99.99+%
2-Bromophenetole BrC6H4OC2H5  98.0+%
Cd
Dimethylcadmium (CH3)2Cd  99.999+%
Diethycadmium  (C2H5)2Cd  99.999+%
Cl
n-Butyl chloride  C4H9Cl  99.999+%
tert-Butyl chloride t-C4H9Cl  99.999+%
Co
Tricarbonylnitrozylcobalt  Co(NO)(CO)3  99.99+%
Fe
Pentacarbonyl iron Fe(CO)5  99.999+%
Iron(III)ethoxide (C2H5O)3Fe  99.5+%
Ga
Trimethylgallium  (CH3)3Ga 99.999+%
Triethylgallium  (C2H5)3Ga 99.999+%
Gallium trichloride  GaCl3  99.999+%
Gallium(III) oxide  Ga2O3  99.999+%
I
Diiodomethane  CH2I2  99.0+%
Iodomethane(Methyl iodide) CH3I  99.999+%
Iodoethane(Ethyl iodide) C2H5I  99.99+%
2-Iodopropane(Isopropyl iodide) i-C3H7I  98.0+%
2-Iodobutane(sec-Butyl iodide) C4H9I  98.0+%
1-Iodo-2-methylpropane(Isobutyl iodide) C4H9I  98.0+%
1-Iodo-3-methylbutane(Isoamyl iodide, Isopentyl iodide) C5H11I  98.0+%
Cyclohexyl iodide(Iodocyclohexane) C6H11I  98.0+%
1-Iodohexane(Hexyl iodide)  C6H13I  98.0+%
Iodoform CHI3  99.5+%
Diiodditimol C20H24O2I2  99.5+%
In
Trimethylindium (CH3)3In  99.999+%
Triethylindium  (C2H5)3In  99.999+%
Ethyldimethylindium(EdMln)  (C2H5)In(CH3)2 99.999+%
Indium(III)isopropoxide (i-C3H7O)3In  99.999+%
Indium(III) oxide  In2O3  99.999+%
Li
n-Butyllithium(1.6M in n-hexane)  C4H9Li
Methyllithium(1.6M in diethylether) (CH3)Li
Mg
Bis(cyclopentadienyl)magnesium  (C5H5)2Mg  99.99+%
Bis(methylcyclopentadienyl)magnesium  (CH3C5H4)2Mg  99.99+%
Bis(ethylcyclopentadienyl)magnesium  (C2H5C5H4)2Mg  99.99+%
N
1.1-Di-methyl-hydrazine (CH3)2NNH2  99.999+%
5-Chloroisatine  C8H4CINO2  95.0+%
Nb
Niobium ethoxide  (C2H5O)5Nb  99.99+%
Ni
Tetracarbonyl nickel Ni(CO)4  99.99+%
P
Tris-(dimethylamino)-phosphine P(N(CH3)2)3  99.999+%
Phosphorus trichloride  PCl3  99.9999+%
Phosphorus oxitrichloride POCl3  99.9999+%
Sb
Trimethylantimony (CH3)3Sb  99.999+%
Triethylantimony (C2H5)3Sb  99.999+%
tert-butyldimethylantimony  (t-Bu)Me2Sb  99.999+%
Tris-(dimethylamino)-antimony  Sb(N(CH3)2)3  99.999+%
Se
Dimethylselenium  (CH3)2Se  99.999+%
Diethylselenium  (C2H5)2Se  99.999+%
Diisopropylselenium (I-C3H7)2Se  99.999+%
Diallylselenium  (C3H5)2Se  99.999+%
Methylallyselenium  (Ch3)Se(C3H5)  99.999+%
Di-tert-butylselenium  (t-C4H9)2Se  99.999+%
Si
Tetraethoxisilane (C2H5O)4Si  99.9999+%
Sn
Tetramethyltin  (CH3)4Sn  99.999+%
Tetraethyltin (C2H5)4Sn  99.999+%
Ti
Trimethylthallium  (CH3)3Ti  99.999+%
Ta
Tantalum ethoxide  (C2H5O)5Ta 99.99+%
Te
Dimethyltelluride  (CH3)2Te  99.999+%
Diethyltelluride  (C2H5)2Te  99.999+%
Diisopropyltelluride  (i-C3H7)2Te  99.999+%
Diallyltelluride  (C3H5)2Te  99.999+%
Methylallyltelluride (CH3)Te(C3H5)  99.999+%
Y
Yttrium(III) isopropoxide (i-C3H7O)3Y  99.5+%
Zn
Dimethylzinc  (CH3)2Zn  99.999+%
Diethylzinc  (C2H5)2Zn  99.9999+%
Organic compounds
Betulinic acid  C30H48O3 m.p.295-298?